Author: Sakai, H.
Paper Title Page
IR-FEL Project at the cERL and Future EUV-FEL Lithography  
  • R. Kato, Y. Honda, H. Kawata, T. Miyajima, N. Nakamura, H. Sakai, M. Shimada, Y. Tanimoto, K. Tsuchiya
    KEK, Ibaraki, Japan
  Recently KEK has launched an infrared FEL project with a competitive funding from NEDO (New Energy and Industrial Technology Development Organization). The purpose of this project is to build a mid-infrared FEL at the compact Energy Recovery Linac (cERL), and to use that FEL as a light source for construction of the processing database required for industrial lasers. The FEL system is composed of two 3 m undulators and a matching section between them, and generates light with a maximum pulse energy of 1 µJ at the wavelength of 20 µm with an 81.25 MHz repetition rate. The FEL is also expected to become a proof-of-concept machine for ERL base FELs for future EUV lithography. The detail of the project will be presented, and the relationship of the technical development between the mid-infrared FEL and the future EUV-FEL will be discussed.  
slides icon Slides THA03 [5.424 MB]  
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